Definition
An in-situ monitoring method that detects when an etch process reaches its intended endpoint by tracking a process-sensitive signal or metrology measurement and identifying a defined threshold or transition.
Application
Used to stop or change an etch recipe at the correct time using methods such as optical emission, interferometry or other chamber sensors, reducing overetch and protecting underlying materials while improving depth and rate control.
Related search terms
Etch endpoint detection; endpoint monitoring
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Related concepts
Evidence and further reading
- Evidence from newsroom.lamresearch.comhttps://newsroom.lamresearch.com/In-situ-Metrology-for-Etch-Endpoint-Detection
- Evidence from newsroom.lamresearch.comhttps://newsroom.lamresearch.com/2000-11-16-Lam-Research-Corporation-Launches-Industrys-First-200-And-300-Mm-Capable-Etch-Product-Line