Definition
A semiconductor process-control technique that adjusts recipe parameters between wafer, lot, or batch runs using equipment, process, and metrology data, with feedback and/or feedforward information.
Application
Used to compensate for process shifts and drift and reduce variation in lithography, chemical mechanical polishing, and chemical vapor deposition.
Related search terms
Run-to-run process control
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Related concepts
Evidence and further reading
- Evidence from tsapps.nist.govhttps://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=924090
- Evidence from tsapps.nist.govhttps://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=32428