Definition
A cyclic etch technique that separates surface modification from material-removal steps so each cycle removes a controlled, self-limited amount of material.
Application
Used for atomic-scale etch control in advanced logic and memory structures where conventional continuous plasma etching can create excessive damage, profile variation or loss of selectivity.
Related search terms
Atomic-layer etching
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Related concepts
Evidence and further reading
- Evidence from newsroom.lamresearch.comhttps://newsroom.lamresearch.com/Tech-Brief-All-About-ALE
- Evidence from newsroom.lamresearch.comhttps://newsroom.lamresearch.com/New-Atomic-Layer-Etching-Capability-Enables-Continued-Device-Scaling