Definition
In plasma processing, transfer of radio-frequency electrical energy through the electric field between conductors or electrodes separated by the plasma and intervening dielectric or sheath regions.
Application
Used to sustain or bias RF discharges in parallel-plate plasma reactors; the coupled electric field accelerates electrons to ionize process gas and can also control ion bombardment at the wafer.
Related search terms
RF capacitive coupling; capacitive power coupling
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Related concepts
Evidence and further reading
- Evidence from patents.google.comhttps://patents.google.com/patent/US8070911B2/en
- Evidence from nanofabrication.nd.eduhttps://nanofabrication.nd.edu/facilities/equipment/