Definition
A low-pressure plasma generated primarily by an RF electric field established between facing electrodes, with the process gas ionized in the space between them.
Application
Used in reactive ion etching, plasma cleaning and some deposition systems because electrode RF power can sustain the discharge and establish wafer-bias conditions that influence ion energy and directionality.
Related search terms
Capacitively coupled discharge; parallel-plate plasma
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Related concepts
Evidence and further reading
- Evidence from patents.google.comhttps://patents.google.com/patent/US8070911B2/en
- Evidence from nanofabrication.nd.eduhttps://nanofabrication.nd.edu/facilities/equipment/