Definition
A patterned dielectric etch used to open contact holes or trenches through insulating material so underlying transistor or conductive regions can later be connected by a contact metal.
Application
Used in MOL and memory fabrication to form high-aspect-ratio contact openings with controlled profile and selectivity while avoiding damage to source/drain, silicide or other underlying structures.
Related search terms
Contact-hole etch; contact dielectric etch
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Related concepts
Evidence and further reading
- Evidence from ir.appliedmaterials.comhttps://ir.appliedmaterials.com/news-releases/news-release-details/applied-materials-new-enabler-e5-system-solves-critical-contact
- Evidence from ir.appliedmaterials.comhttps://ir.appliedmaterials.com/news-releases/news-release-details/applied-materials-continues-advance-merie-technology-new