Contact

10 BEOL Interconnect & Metallization

Definition

A deliberately formed conductive structure that electrically connects a transistor terminal or semiconductor region to local or back-end interconnect wiring.

Application

Used to carry current between source/drain or gate regions and the metal interconnect stack. Contact material, interface quality, area and resistivity are critical because contact resistance can dominate parasitic resistance at advanced nodes.

Related search terms

Transistor contact; source/drain contact; local contact

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Related concepts

Evidence and further reading