Definition
A microscopy and nanofabrication technique that focuses an ion beam onto a small site for material removal, imaging, deposition assistance, or specimen preparation.
Application
Used in semiconductor failure analysis for cross-sectioning, TEM lamella preparation, circuit edit, defect localization, and site-specific material analysis.
Related search terms
Focused Ion Beam; FIB
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Related concepts
Evidence and further reading
- Evidence from thermofisher.comhttps://www.thermofisher.com/de/de/home/electron-microscopy/products/dualbeam-fib-sem-microscopes/helios-5-dualbeam.html
- Evidence from thermofisher.comhttps://www.thermofisher.com/de/de/home/electron-microscopy/products/dualbeam-fib-sem-microscopes/helios-5-exl-dualbeam.html