Definition
The average film-thickness increment produced per complete atomic layer deposition cycle under specified process conditions.
Application
Used to characterize ALD process behavior and to estimate cycle count required for a target film thickness while monitoring self-limiting growth.
Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/publications/atomic-layer-deposition-mos2-films-using-bistert-butylimido-bisdimethylamidomolybdenum
- Evidence from intel.comhttps://www.intel.com/pressroom/archive/releases/2001/20011126tech.htm