Definition
In-situ doping is the intentional incorporation of dopant species while a semiconductor layer is being grown or deposited, rather than introducing the dopant only in a separate post-growth implantation or diffusion step.
Application
Epitaxy processes use in-situ doping to form source/drain, channel, or contact-related semiconductor layers with electrical properties engineered during growth.
Related search terms
in situ doped epitaxy; in-situ doped epi
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Related concepts
Evidence and further reading
- Evidence from appliedmaterials.comhttps://www.appliedmaterials.com/tw/zh_tw/semiconductor/products/processes/selective-processes/centura-prime-epi.html
- Evidence from ir.appliedmaterials.comhttps://ir.appliedmaterials.com/news-releases/news-release-details/applied-materials-unveils-new-epitaxy-technology-high