Definition
Junction depth is the distance from the semiconductor surface to the metallurgical junction where the net dopant concentration changes conductivity type.
Application
Used to control and verify implanted or diffused source/drain and other junction profiles that influence device electrostatics, breakdown, and scaling.
Related search terms
metallurgical junction depth
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/publications/ultrafast-deep-dopant-diffusion-crystalline-silicon-laser-induced-full-area-surface
- Evidence from nvlpubs.nist.govhttps://nvlpubs.nist.gov/nistpubs/Legacy/IR/nbsir81-2398.pdf