Definition
Laser annealing uses short, intense laser heating to thermally modify semiconductor material with a localized and tightly limited thermal budget.
Application
Used after implantation or during advanced integration for dopant activation, lattice-damage repair, recrystallization, and related thermal processing while limiting heat exposure elsewhere.
Related search terms
laser annealing; pulsed laser anneal
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Related concepts
Evidence and further reading
- Evidence from journals.aps.orghttps://journals.aps.org/prb/abstract/10.1103/PhysRevB.23.2923
- Evidence from nist.govhttps://www.nist.gov/publications/pulsed-krf-excimer-laser-dopant-activation-nanocrystal-silicon-silicon-dioxide-matrix