Laser Spike Annealing

04 Thermal Processing, Implant, Doping & Oxidation

Notation LSA

Definition

Laser spike annealing is a millisecond-scale laser thermal process that rapidly raises a wafer surface region to high temperature while limiting bulk thermal exposure.

Application

Used in advanced front-end processing to activate dopants and reduce resistance while controlling diffusion and thermal-budget effects at scaled nodes.

Related search terms

millisecond laser anneal; LSA

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Related concepts

Evidence and further reading

  • Evidence from ir.veeco.comhttps://ir.veeco.com/news-and-events/news-details/2025/Veecos-Laser-Annealing-Platform-Named-Production-Tool-of-Record-for-New-Applications-at-Leading-Edge-Logic-Manufacturers/default.aspx
  • Evidence from ir.veeco.comhttps://ir.veeco.com/news-and-events/news-details/2025/Veecos-Laser-Spike-Annealing-LSA-System-Selected-by-Leading-Semiconductor-Memory-Company-for-Advanced-DRAM-Evaluation/default.aspx