Definition
Chemical vapor deposition performed at reduced pressure to deposit controlled thin films from gaseous precursors on heated substrates.
Application
Used for semiconductor films such as polysilicon, silicon nitride, and oxides where conformality, uniformity, and controlled film properties are required.
Related search terms
LP-CVD
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/laboratories/tools-instruments/nanofab-tool-sandvik-lpcvd-lto
- Evidence from nanoguide.stanford.eduhttps://nanoguide.stanford.edu/guide/equipment/purpose/deposition/chemical-vapor-deposition-cvd/low-pressure-lp-cvd