Definition
A thin-film deposition process in which volatile precursor species are delivered to a heated or activated substrate and react or decompose at the surface to form a solid film while gaseous byproducts are removed.
Application
Used to deposit dielectric, semiconductor and conductive films for transistor structures, spacers, liners, interlayer dielectrics, gap fill, contacts and many other front-end and back-end layers.
Related search terms
Chemical-vapor deposition
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Related concepts
Evidence and further reading
- Evidence from appliedmaterials.comhttps://www.appliedmaterials.com/us/en/semiconductor/products/processes/cvd.html
- Evidence from asm.comhttps://www.asm.com/our-technology-products/pecvd