Definition
In atomic layer deposition (ALD), a precursor is a process chemical introduced in a controlled pulse so that sequential surface reactions build a thin film layer by layer.
Application
Used in ALD and PEALD, where precursor selection and controlled pulse/delivery behavior help determine process control, film purity, uniformity, and other film properties.
Related search terms
Deposition precursor; Process precursor
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Related concepts
Evidence and further reading
- Evidence from asm.comhttps://www.asm.com/our-technology-products/ald
- Evidence from asm.comhttps://www.asm.com/our-technology-products/ald/xp4-pulsar