Definition
One complete atomic layer deposition sequence, typically consisting of a precursor exposure, purge, co-reactant exposure and second purge, with the sequence repeated to build the desired film thickness.
Application
Used as the basic repeat unit for ALD thickness control; cycle count and growth per cycle determine the deposited film thickness.
Related search terms
Atomic-layer-deposition cycle
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Related concepts
Evidence and further reading
- Evidence from asm.comhttps://www.asm.com/our-technology-products/ald
- Evidence from newsroom.lamresearch.comhttps://newsroom.lamresearch.com/Tech-Brief-A-Look-at-Atomic-Layer-Deposition-ALD