Definition
In atomic layer deposition, a purge is the inert-gas portion of the pulse/purge cycle that separates sequential reactant-delivery steps.
Application
Used to control ALD pulse/purge cycling and gas-flow dynamics; purge timing affects cycle time and is engineered to support film purity, uniformity, repeatability, and throughput.
Related search terms
Process purge; Inert-gas purge
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from asm.comhttps://www.asm.com/our-technology-products/ald
- Evidence from asm.comhttps://www.asm.com/our-technology-products/ald/xp4-pulsar