Definition
Nitric acid (HNO3) is a strong oxidizing acid used as a component of semiconductor wet-chemical formulations, including mixtures formulated to etch or clean selected materials.
Application
Used in VLSI-grade wet processing and in acid mixtures for semiconductor and thin-film fabrication; the exact chemistry is selected for the target material and process.
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nitric acid
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Evidence and further reading
- Evidence from microchemicals.comhttps://www.microchemicals.com/Nitric-Acid-69.5-2.50-l-VLSI-PERSO-EVE-EUD/TSAV1025
- Evidence from transene.comhttps://transene.com/nb/