Definition
A chemical-processing workstation configured for operations such as substrate cleaning and wet etching.
Application
Provides facilities for wafer cleaning, photoresist removal, and acid or base etching, according to the bench configuration.
Related concepts
Evidence and further reading
- Evidence from research.yale.eduhttps://research.yale.edu/cores/wet-benches
- Evidence from nanoguide.stanford.eduhttps://nanoguide.stanford.edu/guide/equipment/purpose/etching/wet-etching/acid-or-base-wet-etching