Definition
A multi-step silicon-wafer wet-clean sequence based on RCA chemistries, commonly including SC-1 alkaline-peroxide cleaning and SC-2 acidic-peroxide cleaning, with an oxide-removal step used where the process requires it.
Application
Used to prepare wafer surfaces for subsequent processing by removing organic contamination, particles and metallic contamination with sequenced wet-clean chemistries.
Related search terms
RCA wafer clean; RCA cleaning
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from cni.columbia.eduhttps://cni.columbia.edu/rca-station
- Evidence from snfguide.stanford.eduhttps://snfguide.stanford.edu/guide/equipment/purpose/cleaning/pre-diffusion-clean?qt-processing_technique_tabs=0