Definition
Wafer cleaning that treats an individual wafer at each processing station, rather than cleaning a batch together; one tool can contain multiple such stations or chambers.
Application
Used for wafer-surface particle removal and pre- or post-process surface preparation, with cleaning and drying approaches selected to limit damage to patterned features.
Related search terms
single wafer cleaning
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Related concepts
Evidence and further reading
- Evidence from screen.co.jphttps://www.screen.co.jp/eng/spe/mt-images/SPE160901E.pdf
- Evidence from tel.comhttps://www.tel.com/product/cellesta.html