Definition
Wet cleaning in which multiple wafers are processed together as a batch, for example in common chemical and rinse baths or in a batch spray chamber, followed by drying.
Application
Used for high-throughput wafer cleaning, oxide removal and RCA-type wet processing when the chemistry and contamination requirements are compatible with the selected multi-wafer bath or spray process.
Related search terms
Batch wafer cleaning; wet-station batch cleaning
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Related concepts
Evidence and further reading
- Evidence from screen.co.jphttps://www.screen.co.jp/spe/en/products/ws-620c820l
- Evidence from tel.comhttps://www.tel.com/product/zeta.html