Definition
The Standard Clean 2 step of RCA wafer cleaning, using hydrochloric acid, hydrogen peroxide, and water primarily to remove metallic and ionic contamination from silicon surfaces.
Application
Typically used after SC-1 to reduce residual metal-ion contamination before further semiconductor processing, including gate-oxide deposition.
Related search terms
Standard Clean 2; RCA-2 clean
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Related concepts
Evidence and further reading
- Evidence from cni.columbia.eduhttps://cni.columbia.edu/s/RCA_Clean_Basics_Nov2017.pdf
- Evidence from rena.comhttps://www.rena.com/en/technology/process-technology/cleaning