Definition
Standard Clean 1, an alkaline RCA wafer-cleaning step using ammonium hydroxide, hydrogen peroxide, and water to remove organic residues and particles from silicon surfaces.
Application
Used for silicon-wafer surface preparation before critical fabrication steps, including gate-oxide deposition.
Related search terms
Standard Clean 1; RCA-1 clean
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Related concepts
Evidence and further reading
- Evidence from cni.columbia.eduhttps://cni.columbia.edu/s/RCA_Clean_Basics_Nov2017.pdf
- Evidence from rena.comhttps://www.rena.com/en/technology/process-technology/cleaning