Definition
Pad conditioning is a CMP operation that cleans and restores or maintains the polishing-pad surface so its material-removal performance remains stable and repeatable.
Application
Used during chemical mechanical planarization to control pad surface condition, limit glazing or loading effects, and stabilize removal performance through pad life.
Related concepts
Evidence and further reading
- Evidence from appliedmaterials.comhttps://www.appliedmaterials.com/us/en/product-library/reflexion-lk-cmp.html
- Evidence from 3m.comhttps://www.3m.com/3M/en_US/p/d/b5005541000/