Definition
A plasma source is the hardware that couples energy into a process gas to generate and sustain a plasma for semiconductor processing.
Application
Used in plasma etch, deposition, cleaning, and atomic-scale processes; source design and operating conditions determine the available ions and reactive species and influence process uniformity.
Related search terms
Plasma generator; Plasma generation source
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Related concepts
Evidence and further reading
- Evidence from plasma.oxinst.comhttps://plasma.oxinst.com/technologies/atomic-scale-processing
- Evidence from plasma.oxinst.comhttps://plasma.oxinst.com/products/icpcvd/plasmapro-100-icpcvd