Definition
A plasma configuration in which reactive species are generated in a plasma source separated from the main wafer process region and are transported downstream to the treatment region.
Application
Used for process-chamber cleaning, reactive etch or deposition, and downstream removal of photoresist and other organic materials using remotely generated reactive species.
Related search terms
Remote plasma processing; Downstream plasma
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Related concepts
Evidence and further reading
- Evidence from advancedenergy.comhttps://www.advancedenergy.com/en-us/products/plasma-power-products/remote-plasma-sources/xstream/
- Evidence from nist.govhttps://www.nist.gov/laboratories/tools-instruments/nanofab-tool-allwin21-downstream-asher