Definition
Plasma uniformity is the spatial consistency of plasma-generated conditions or species across the wafer or process region.
Application
Used as a process-control metric because nonuniform plasma conditions can produce across-wafer differences in etch, deposition, or surface treatment; source geometry and operating conditions are tuned to improve uniformity.
Related search terms
Plasma process uniformity
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Related concepts
Evidence and further reading
- Evidence from plasma.oxinst.comhttps://plasma.oxinst.com/technologies/atomic-scale-processing
- Evidence from plasma.oxinst.comhttps://plasma.oxinst.com/products/icpcvd/plasmapro-100-icpcvd