Definition
An etch step that intentionally removes material below the surrounding surface to form a recessed region with a controlled depth, profile, and material selectivity.
Application
Used to form gate, source/drain, or other recessed device regions before subsequent gate-stack formation, epitaxial regrowth, or material fill.
Related search terms
Etched recess; Recess etching
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from patents.google.comhttps://patents.google.com/patent/US20090032880A1/en
- Evidence from patents.google.comhttps://patents.google.com/patent/US8987091B2/en