Definition
A cleaning process in which a remote plasma source dissociates a cleaning gas and delivers reactive species downstream to remove residues from a chamber or exposed surface.
Application
Used for chamber and surface cleaning with remote reactive species, including fluorine-bearing chemistry for chamber films and oxygen-radical chemistry for organic or resist residue removal.
Related search terms
Remote chamber clean; Downstream plasma clean
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Related concepts
Evidence and further reading
- Evidence from advancedenergy.comhttps://www.advancedenergy.com/en-us/products/plasma-power-products/remote-plasma-sources/xstream/
- Evidence from nist.govhttps://www.nist.gov/laboratories/tools-instruments/nanofab-tool-allwin21-downstream-asher