Definition
A destructive surface-analysis technique that bombards a solid with primary ions and mass-analyzes the emitted secondary ions to determine composition.
Application
Used in dynamic mode to measure dopant and contaminant depth distributions in semiconductor materials; quantitative concentrations require suitable calibration standards.
Related concepts
Evidence and further reading
- Evidence from cameca.comhttps://www.cameca.com/products/sims/technique
- Evidence from nist.govhttps://www.nist.gov/programs-projects/magnetic-sector-secondary-ion-mass-spectrometry