Definition
An intentionally introduced impurity species used to modify a semiconductor's carrier concentration, conductivity type or other electrical properties, typically by acting as a donor or acceptor when electrically active.
Application
Introduced by ion implantation, diffusion or in-situ growth to form wells, source/drain regions, channel or threshold adjustments and other electrically engineered regions; species, dose, energy, spatial profile and activation are controlled.
Related search terms
Doping impurity; semiconductor dopant
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Related concepts
Evidence and further reading
- Evidence from ibm.comhttps://www.ibm.com/think/topics/semiconductors
- Evidence from semiconductors.orghttps://www.semiconductors.org/wp-content/uploads/2023/07/FINAL-PFAS-Containing-Articles-Used-in-Semiconductor-Manufacturing.pdf