Dopant

04 Thermal Processing, Implant, Doping & Oxidation

Definition

An intentionally introduced impurity species used to modify a semiconductor's carrier concentration, conductivity type or other electrical properties, typically by acting as a donor or acceptor when electrically active.

Application

Introduced by ion implantation, diffusion or in-situ growth to form wells, source/drain regions, channel or threshold adjustments and other electrically engineered regions; species, dose, energy, spatial profile and activation are controlled.

Related search terms

Doping impurity; semiconductor dopant

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Related concepts

Evidence and further reading