Definition
Atomic layer deposition that exploits differences in surface chemistry to favor film growth on selected surface areas while suppressing growth on others.
Application
Used for self-aligned thin-film patterning; demonstrated for growing hafnium oxide selectively on platinum bottom electrodes in resistive RAM devices.
Related search terms
area-selective ALD; area-selective atomic layer deposition
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from pmc.ncbi.nlm.nih.govhttps://pmc.ncbi.nlm.nih.gov/articles/PMC6369656/
- Evidence from poplab.stanford.eduhttps://poplab.stanford.edu/pdfs/OhKhan-ASALDforRRAM-acsami23.pdf