Definition
A deposition approach engineered so film growth occurs on selected surface materials or regions while growth is inhibited on adjacent surfaces.
Application
Used for self-aligned nanoscale patterning and interconnect integration, including dielectric-on-dielectric or metal-selective schemes that reduce edge-placement error and alignment burden.
Related search terms
Selective deposition; area-selective ALD (when ALD chemistry is used)
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Related concepts
Evidence and further reading
- Evidence from asm.comhttps://www.asm.com/news/materials-innovation-at-the-atomic-scale
- Evidence from asm.comhttps://www.asm.com/news/semicon-taiwan-2025-shaping-tomorrow-with-atomic-precision