Definition
Measurement of sheet resistance at multiple locations on a wafer or film to show its spatial variation.
Application
Used to assess across-wafer electrical uniformity of metal films and doped layers and to monitor doping and implant processes.
Related concepts
Evidence and further reading
- Evidence from kla.comhttps://www.kla.com/wp-content/uploads/R50-1.pdf
- Evidence from nvlpubs.nist.govhttps://nvlpubs.nist.gov/nistpubs/Legacy/TN/nbstechnicalnote806.pdf