Definition
Recrystallization of an amorphous semiconductor region from an adjacent crystalline seed by movement of the crystal–amorphous interface, without melting.
Application
Used after ion implantation to restore crystalline material and activate implanted dopants, including in silicon-on-insulator device processing.
Related search terms
solid-phase epitaxial regrowth
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Related concepts
Evidence and further reading
- Evidence from arxiv.orghttps://arxiv.org/pdf/2205.04669
- Evidence from juser.fz-juelich.dehttps://juser.fz-juelich.de/record/15165/files/1.3520665-1.pdf?subformat=pdfa