Definition
In silicon fabrication, oxide growth that converts the silicon surface to silicon dioxide, typically by reaction with oxygen or water vapor at elevated temperature.
Application
Used to form gate dielectrics, device-isolation oxides and masks against dopant implantation.
Related concepts
Evidence and further reading
- Evidence from utep.eduhttps://www.utep.edu/engineering/nanomil/processes/oxidation_basics.html
- Evidence from iue.tuwien.ac.athttps://www.iue.tuwien.ac.at/phd/hollauer/node10.html