Definition
Thermal oxidation of silicon using dry molecular oxygen as the oxidant, producing silicon dioxide more slowly than wet oxidation and commonly enabling thin, electrically high-quality oxide films.
Application
Used to grow controlled thin SiO2 films for gate-dielectric studies, masking, isolation and surface passivation where oxide thickness and electrical quality require tight control.
Related search terms
Dry thermal oxidation; O2 oxidation
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Related concepts
Evidence and further reading
- Evidence from semiconductor.samsung.comhttps://semiconductor.samsung.com/support/tools-resources/fabrication-process/eight-essential-semiconductor-fabrication-processes-part-2-oxidation-to-protect-the-wafer/
- Evidence from nist.govhttps://www.nist.gov/laboratories/tools-instruments/nanofab-tool-sandvik-oxidation-furnaces