Definition
The energy barrier associated with a thermally activated physical or chemical process, commonly appearing in Arrhenius-type relationships between process rate and temperature.
Application
Used to model temperature-dependent semiconductor processes such as diffusion, dopant activation, defect motion, reactions and accelerated reliability behavior.
Related search terms
Activation barrier
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/publications/probe-assisted-localized-doping-aluminum-silicon-substrates
- Evidence from nvlpubs.nist.govhttps://nvlpubs.nist.gov/nistpubs/Legacy/SP/nbsspecialpublication337.pdf