Definition
Automated analysis that assigns detected wafer or pattern defects to defect classes using image features, design context, rules, statistical methods or machine-learning algorithms.
Application
Used with optical or e-beam inspection to accelerate defect review, identify systematic defect signatures, prioritize root-cause work and feed yield-learning systems.
Related search terms
Auto defect classification; automated defect classification
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/products/metrology-and-inspection-systems/hmi-ep5
- Evidence from semi.orghttps://www.semi.org/en/advanced-semiconductor-manufacturing-conference-asmc/2024-session-18-factory-automation