Definition
The in-line detection and location of physical or pattern defects on semiconductor wafers using optical, electron-beam or other inspection methods, typically producing defect coordinates and signal or image data.
Application
Used after process steps to detect excursions, map random and systematic defect signatures, monitor tool cleanliness and feed selected defect locations to review and classification workflows for yield learning.
Related search terms
Wafer defect inspection; defect detection
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Related concepts
Evidence and further reading
- Evidence from hitachi-hightech.comhttps://www.hitachi-hightech.com/global/en/knowledge/semiconductor/room/manufacturing/inspection.html
- Evidence from hitachi-hightech.comhttps://www.hitachi-hightech.com/us/en/products/semiconductor-manufacturing/cd-sem/inspection-solution/is.html