Definition
The electrical current carried by an ion beam, representing the rate of charge transported through the implantation beam path and ultimately toward the wafer.
Application
Used in ion implantation to control dose rate and productivity; higher beam current can shorten implant time but can also increase beam-transport, heating, outgassing and contamination-control challenges.
Related search terms
Ion-beam current; implant beam current
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Related concepts
Evidence and further reading
- Evidence from axcelis.comhttps://www.axcelis.com/wp-content/uploads/2023/01/Introducing_the_PurionH200_Single_Wafer_High_Current_Implanter.pdf
- Evidence from axcelis.comhttps://www.axcelis.com/wp-content/uploads/2019/03/Substrate-condition-and-metrology-considerations-in-Poly-implants.pdf