Definition
The ion-implant subsystem that transports and conditions ions from the source to the wafer using elements such as extraction optics, analyzing or filter magnets, acceleration or deceleration stages, focusing and angle-control components.
Application
Used to select the desired implant species and charge state, control ion energy and incidence angle, suppress contamination, shape the beam and deliver a repeatable dose to the wafer.
Related search terms
Ion-implant beamline; beam transport line
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Related concepts
Evidence and further reading
- Evidence from appliedmaterials.comhttps://www.appliedmaterials.com/us/en/product-library/viista-900-3d.html
- Evidence from appliedmaterials.comhttps://www.appliedmaterials.com/jp/ja/semiconductor/products/modify/implant.html