Definition
A molecular ion used for p-type ion implantation in which one boron atom is implanted together with two fluorine atoms; BF2+ is generated from fluorine-containing boron source chemistry such as BF3.
Application
Used for low-energy and high-dose boron implantation, including source/drain and extension engineering; the heavier molecular ion can improve low-energy beam transport, while the accompanying fluorine can alter implant damage and post-anneal boron behavior.
Related search terms
BF2 implant; boron difluoride molecular ion
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Related concepts
Evidence and further reading
- Evidence from axcelis.comhttps://www.axcelis.com/wp-content/uploads/2019/03/Improved-Ion-Source-Stability-Using-H2-Co-gas-For-Flouride-Dopants.pdf
- Evidence from axcelis.comhttps://www.axcelis.com/wp-content/uploads/2019/03/Materials-Modification-Implants-for-Advanced-Devices-1.pdf