Definition
A scanning electron microscope optimized and calibrated for automated measurement of semiconductor critical dimensions from high-resolution electron images.
Application
Used in production lithography and etch control to measure line widths, spaces, contact holes, vias, CD uniformity and edge roughness with high repeatability while limiting beam-induced sample damage.
Related search terms
Critical Dimension Scanning Electron Microscope
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from hitachi-hightech.comhttps://www.hitachi-hightech.com/global/en/knowledge/semiconductor/room/manufacturing/cd-sem.html
- Evidence from hitachi-hightech.comhttps://www.hitachi-hightech.com/us/en/products/advanced-analytical/microscopy/cdsem.html