Definition
The measurement science and production metrology used to determine semiconductor critical dimensions with known precision, accuracy and traceability.
Application
Used to monitor lithography and etch processes, calibrate production tools, control process drift and verify that printed or etched features meet dimensional targets. Common methods include CD-SEM, CD-AFM and optical/scatterometry techniques.
Related search terms
Critical-dimension measurement; linewidth metrology
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Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/publications/accuracy-considerations-critical-dimension-semiconductor-metrology
- Evidence from nist.govhttps://www.nist.gov/publications/critical-dimension-and-overlay-metrology