Definition
A patterned feature dimension that must be tightly controlled because variation in that dimension materially affects semiconductor device performance, manufacturability or yield.
Application
Used in lithography, etch and process control to specify and measure dimensions such as line width, space width, contact diameter or gate-related features. In lithography discussions, CD commonly refers to the smallest feature size being printed.
Related search terms
Critical feature size; critical linewidth
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/technology/lithography-principles/rayleigh-criterion
- Evidence from hitachi-hightech.comhttps://www.hitachi-hightech.com/global/en/knowledge/semiconductor/room/manufacturing/cd-sem.html