Definition
Measurement of a pattern feature's critical dimension, such as line width, space width, contact diameter or via diameter, at a defined location and measurement condition.
Application
Used after lithography and etch to monitor patterning accuracy, uniformity and process drift, and to verify that features stay within dimensional limits required for device performance and yield.
Related search terms
Critical-dimension measurement; linewidth measurement
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Related concepts
Evidence and further reading
- Evidence from hitachi-hightech.comhttps://www.hitachi-hightech.com/global/en/knowledge/semiconductor/room/manufacturing/cd-sem.html
- Evidence from nist.govhttps://www.nist.gov/publications/high-resolution-transmission-electron-microscopy-calibration-critical-dimension