Definition
An imaging technique that scans a focused electron beam across a specimen surface and forms an image from emitted secondary electrons or backscattered electrons.
Application
Used to image semiconductor surface features and measure dimensions of patterned chip structures.
Related concepts
Evidence and further reading
- Evidence from jeol.comhttps://www.jeol.com/words/emterms/20121023.054958.php
- Evidence from nist.govhttps://www.nist.gov/news-events/news/2018/12/next-generation-chips-require-multiple-measurement-approaches